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        <datestamp>2023-06-21T02:21:27Z</datestamp>
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          <dc:title>Electrical and Photoconductive Properties at 1.8 K of Germanium p+-i Junction Device Fabricated by Surface-Activated Wafer Bonding</dc:title>
          <dc:creator>金田, 英宏</dc:creator>
          <dc:creator>和田, 武彦</dc:creator>
          <dc:creator>大藪, 進喜</dc:creator>
          <dc:creator>狩野, 良子</dc:creator>
          <dc:creator>桐山, 雄一</dc:creator>
          <dc:creator>服部, 和生</dc:creator>
          <dc:creator>鈴木, 仁研</dc:creator>
          <dc:creator>Ide, Kensuke</dc:creator>
          <dc:creator>Kato, Masahiro</dc:creator>
          <dc:creator>渡辺, 健太郎</dc:creator>
          <dc:creator>Kaneda, Hidehiro</dc:creator>
          <dc:creator>Wada, Takehiko</dc:creator>
          <dc:creator>Oyabu, Shinki</dc:creator>
          <dc:creator>Kano, Ryoko</dc:creator>
          <dc:creator>Kiriyama, Yuichi</dc:creator>
          <dc:creator>Hattori, Yasuki</dc:creator>
          <dc:creator>Suzuki, Toyoaki</dc:creator>
          <dc:creator>Ide, Kensuke</dc:creator>
          <dc:creator>Kato, Masahiro</dc:creator>
          <dc:creator>Watanabe, Kentaroh</dc:creator>
          <dc:description>Accepted: 2011-03-12</dc:description>
          <dc:description>資料番号: SA1003077000</dc:description>
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          <dc:publisher>The Japan Society of Applied Physics</dc:publisher>
          <dc:date>2011-06</dc:date>
          <dc:identifier>Japanese Journal of Applied Physics</dc:identifier>
          <dc:identifier>6-1</dc:identifier>
          <dc:identifier>50</dc:identifier>
          <dc:identifier>0021-4922</dc:identifier>
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