@inproceedings{oai:jaxa.repo.nii.ac.jp:00016266,
 author = {村本, 哲也 and Muramoto, Tetsuya},
 book = {平成24年度宇宙輸送シンポジウム: 講演集録, Proceedings of Space Transportation Symposium: FY2012},
 month = {Jan},
 note = {平成24年度宇宙輸送シンポジウム (2013年1月17日-1月18日. 宇宙航空研究開発機構宇宙科学研究所(JAXA)(ISAS)), 相模原市, 神奈川県, Space Transportation FY2012 (January 17-18, 2013. Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency (JAXA)(ISAS)), Sagamihara, Kanagawa Japan, The low-energy sputtering of carbon material under Xe ion bombardment is studied through the molecular dynamics (MD) simulation. For the normal incidence of Xe, the MD result of sputtering yield almost agrees with the experimental result by Williams et al. (AIAA-2004-3788). However, the experimental result shows a less incident angle dependence than the MD result because the experiment performed on a rough surface. Low density of an amorphous carbon surface brings the decrease of the sputtering yield and the increase of high-energy sputtered atoms. The sputtered atoms from the amorphous surface lost the memory of the incident direction., 形態: カラー図版あり, 形態: PDF, Physical characteristics: Original contains color illustrations, Physical characteristics: PDF, 資料番号: AA0061856130, レポート番号: STEP-2012-047},
 publisher = {宇宙航空研究開発機構宇宙科学研究所(JAXA)(ISAS), Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency (JAXA)(ISAS)},
 title = {MDシミュレーションによるXeイオン照射下でのアモロファス炭素スパッタリングの放出エネルギー・放出角度分布の評価},
 year = {2013}
}