@inproceedings{oai:jaxa.repo.nii.ac.jp:00016773,
 author = {西村, 太一郎 and 小泉, 宏之 and 國中, 均 and 山極, 芳樹 and Nishimura, Taichiro and Koizumi, Hiroyuki and Kuninaka, Hitoshi and Yamagiwa, Yoshiki},
 book = {宇宙輸送シンポジウム: 講演集録, Proceedings of Space Transportation Symposium},
 month = {},
 note = {平成20年度宇宙輸送シンポジウム(2009年1月19日-20日, 宇宙航空研究開発機構宇宙科学研究本部), Measurement technique of differential sputter yield is described in this study. The equipment consists of multiple Quartz Crystal Microbalances that are positioned on a single azimuthally plane from a target region where xenon ion beams are aimed. We measured differential sputter yields for Molybdenum after exposure to Xenon ion bombardment at multiple angles of incidence (0 - 60 deg) and ion energies (200 - 1000 eV). Sputter yield data for Molybdenum are shown for a range of xenon ion energies from 100 eV to 1000 eV and a range of ion beam incidence angle from 0 deg to 75 deg., 形態: カラー図版あり, 資料番号: AA0064292080},
 publisher = {宇宙航空研究開発機構宇宙科学研究本部, Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency (JAXA)},
 title = {イオンエンジングリッド材料に関する微分スパッタ率測定},
 volume = {平成20年度},
 year = {2009}
}