{"created":"2023-06-20T14:35:55.505599+00:00","id":2220,"links":{},"metadata":{"_buckets":{"deposit":"406e9b62-027c-479c-a1e1-43905debb18c"},"_deposit":{"created_by":1,"id":"2220","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"2220"},"status":"published"},"_oai":{"id":"oai:jaxa.repo.nii.ac.jp:00002220","sets":["1887:1893","9:10:200:238"]},"author_link":["4397","4399","4401","4402","4400","4403","4398","4396"],"item_3_alternative_title_2":{"attribute_name":"その他のタイトル（英）","attribute_value_mlt":[{"subitem_alternative_title":"The observation of atomic dynamics in liquid silicon by using inelastic x-ray scattering method coupled with electrostatic levitation method"}]},"item_3_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2007-03-30","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"29","bibliographicPageStart":"25","bibliographicVolumeNumber":"JAXA-RR-06-015E","bibliographic_titles":[{"bibliographic_title":"宇宙航空研究開発機構研究開発報告"},{"bibliographic_title":"JAXA Research and Development Report: Liquid Structure and Transport Properties of High Temperature Metallic Melts","bibliographic_titleLang":"en"}]}]},"item_3_description_16":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"高温融体内の原子の運動に関する実験的な知見は、融体の熱物性と構造の関係を理解する上で極めて重要である。我々は、高温融液の原子ダイナミクスの観察を目的として非弾性X線散乱用の小型の静電浮遊装置を開発し、融点および過冷却液体シリコンの動的構造因子を測定した。本装置を用いることにより液体シリコンのフォノンピークが明瞭に観察され、その分散関係が明らかになった。","subitem_description_type":"Abstract"}]},"item_3_description_17":{"attribute_name":"抄録（英）","attribute_value_mlt":[{"subitem_description":"The atomic dynamics in high temperature melts are essential information for the understanding of the relation between liquid structure and thermo-physical properties in liquid state. The small Electrostatic Levitation furnace, ESL, was developed for the inelastic X-ray scattering facility in SPring-8. The observation of dynamic liquid structure factor, S (Q, w) of normal and undercooled liquid silicon was performed. The phonon peak of S (Q, w) in the liquid silicon was clearly observed and its dispersion relation can be obtained.","subitem_description_type":"Other"}]},"item_3_description_32":{"attribute_name":"資料番号","attribute_value_mlt":[{"subitem_description":"資料番号: AA0063323004","subitem_description_type":"Other"}]},"item_3_description_33":{"attribute_name":"レポート番号","attribute_value_mlt":[{"subitem_description":"レポート番号: JAXA-RR-06-015E","subitem_description_type":"Other"}]},"item_3_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宇宙航空研究開発機構"}]},"item_3_publisher_9":{"attribute_name":"出版者（英）","attribute_value_mlt":[{"subitem_publisher":"Japan Aerospace Exploration Agency (JAXA)"}]},"item_3_source_id_21":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1349-1113","subitem_source_identifier_type":"ISSN"}]},"item_3_source_id_24":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA1192675X","subitem_source_identifier_type":"NCID"}]},"item_3_text_6":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"宇宙航空研究開発機構"},{"subitem_text_value":"宇宙航空研究開発機構"},{"subitem_text_value":"東京大学"},{"subitem_text_value":"千葉工業大学"}]},"item_3_text_7":{"attribute_name":"著者所属（英）","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"Japan Aerospace Exploration Agency"},{"subitem_text_language":"en","subitem_text_value":"Japan Aerospace Exploration Agency"},{"subitem_text_language":"en","subitem_text_value":"University of Tokyo"},{"subitem_text_language":"en","subitem_text_value":"Chiba Institute of Technology"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"正木, 匡彦"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"石川, 毅彦"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"岡田, 純平"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"古池, 紀之"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Masaki, Tadahiko","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Ishikawa, Takehiko","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Okada, Junpei T.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Koike, Noriyuki","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-01-15"}],"displaytype":"detail","filename":"63323004.pdf","filesize":[{"value":"1.7 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"63323004.pdf","url":"https://jaxa.repo.nii.ac.jp/record/2220/files/63323004.pdf"},"version_id":"39a61641-53d7-4034-aa76-a208a0cc7327"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"静電浮遊","subitem_subject_scheme":"Other"},{"subitem_subject":"原子ダイナミクス","subitem_subject_scheme":"Other"},{"subitem_subject":"液体構造","subitem_subject_scheme":"Other"},{"subitem_subject":"液体シリコン","subitem_subject_scheme":"Other"},{"subitem_subject":"電気炉","subitem_subject_scheme":"Other"},{"subitem_subject":"X線散乱","subitem_subject_scheme":"Other"},{"subitem_subject":"非弾性散乱","subitem_subject_scheme":"Other"},{"subitem_subject":"過冷却","subitem_subject_scheme":"Other"},{"subitem_subject":"electrostatic levitation","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"atomic dynamics","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"liquid structure","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"liquid silicon","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"electric furnace","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"X-ray scattering","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"inelastic scattering","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"supercooling","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"technical report","resourceuri":"http://purl.org/coar/resource_type/c_18gh"}]},"item_title":"静電浮遊法とX線非弾性散乱法を用いた液体シリコンの原子ダイナミクスの観察","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"静電浮遊法とX線非弾性散乱法を用いた液体シリコンの原子ダイナミクスの観察"}]},"item_type_id":"3","owner":"1","path":["238","1893"],"pubdate":{"attribute_name":"公開日","attribute_value":"2015-03-26"},"publish_date":"2015-03-26","publish_status":"0","recid":"2220","relation_version_is_last":true,"title":["静電浮遊法とX線非弾性散乱法を用いた液体シリコンの原子ダイナミクスの観察"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-06-21T09:26:26.596329+00:00"}