@article{oai:jaxa.repo.nii.ac.jp:00025297,
 author = {石田, 宏一 and 三浦, 喜直 and 廣瀬, 和之 and 原田, 整 and 成沢, 忠 and Ishida, K. and Miura, Y. and Hirose, Kazuyuki and Harada, S. and Narusawa, T.},
 issue = {12},
 journal = {Applied Physics Letters},
 month = {Mar},
 note = {Accepted: 2003-01-24, 資料番号: SA1001999000},
 pages = {1842--1844},
 title = {Epitaxial growth of CoSi2 on hydrogen-terminated Si(001)},
 volume = {82},
 year = {2003}
}