@article{oai:jaxa.repo.nii.ac.jp:00025298,
 author = {高橋, 健介 and 野平, 博司 and 廣瀬, 和之 and 服部, 健雄 and Takahashi, K. and Nohira, H. and Hirose, Kazuyuki and Hattori, T.},
 issue = {16},
 journal = {Applied Physics Letters},
 month = {Oct},
 note = {Accepted: 2003-08-07, 資料番号: SA1002000000},
 pages = {3422--3424},
 title = {Accurate determination of SiO2 film thickness by X-ray photoelectron spectroscopy},
 volume = {83},
 year = {2003}
}