@article{oai:jaxa.repo.nii.ac.jp:00025309,
 author = {廣瀬, 和之 and 山脇, 師之 and 鳥居, 和功 and 川原, 孝昭 and 川尻, 智司 and 服部, 健雄 and Hirose, Kazuyuki and Yamawaki, M. and Torii, K. and Kawahara, T. and Kawashiri, S. and Hattori, T.},
 issue = {1-4},
 journal = {Applied Surface Science},
 month = {Oct},
 note = {資料番号: SA1002011000},
 pages = {411--415},
 title = {Application of XPS time-dependent measurement to the analysis of charge trapping phenomena in HfAlOx films},
 volume = {237},
 year = {2004}
}