@article{oai:jaxa.repo.nii.ac.jp:00025319,
 author = {望月, 祐志 and 岡本, 穏治 and 石谷, 明彦 and 廣瀬, 和之 and 高田, 俊和 and Mochizuki, Yuji and Okamoto, Yasuharu and Ishitani, Akihiko and Hirose, Kazuyuki and Takada, Toshikazu},
 issue = {3A},
 journal = {Japanese Journal of Applied Physics Letters},
 month = {},
 note = {Accepted: 1995-01-21, 資料番号: SA1002021000},
 pages = {L326--L329},
 title = {On the reaction scheme for Ti/TiN chemical vapor deposition (CVD) process using TiCl4},
 volume = {34},
 year = {1995}
}