@article{oai:jaxa.repo.nii.ac.jp:00026506,
 author = {早川, 泰弘 and Arivanandhan, Mukannan and 齋藤, 洋祐 and 小山, 忠信 and 百瀬, 与志美 and 池田, 浩也 and 田中, 昭 and Wen, Cuilian and 久保田, 義弘 and 中村, 保 and Bhattacharya, Shovit and Aswal, Dinesh Kumar and Babu, Sridharan Moorthy and 稲富, 裕光 and 立岡, 浩一 and Hayakawa, Yasuhiro and Arivanandhan, Mukannan and Saito, Yosuke and Koyama, Tadanobu and Momose, Yoshimi and Ikeda, Hiroya and Tanaka, Akira and Wen, Cuilian and Kubota, Yoshihiro and Nakamura, Tamotsu and Bhattacharya, Shovit and Aswal, Dinesh Kumar and Babu, Sridharan Moorthy and Inatomi, Yuko and Tatsuoka, Hirokazu},
 issue = {24},
 journal = {Thin Solid Films},
 month = {Oct},
 note = {著者人数: 15名, 資料番号: SA1003208000},
 pages = {8532--8537},
 title = {Growth of homogeneous polycrystalline Si1-xGex and Mg2Si1-xGex for thermoelectric application},
 volume = {519},
 year = {2011}
}