@article{oai:jaxa.repo.nii.ac.jp:00029404,
 author = {武内, 数馬 and 江副, 祐一郎 and 石川, 久美 and 中村, 果澄 and 沼澤, 正樹 and 寺田, 優 and 藤谷, 麻衣子 and 伊師, 大毅 and 野田, 祐介 and 大橋, 隆哉 and 森下, 浩平 and 中嶋, 一雄 and 満田, 和久 and Takeuchi, Kazuma and Ezoe, Yuichiro and Ishikawa, Kumi and Nakamura, Kasumi and Numazawa, Masaki and Terada, Masaru and Fujitani, Maiko and Ishi, Daiki and Noda, Yusuke and Ohashi, Takaya and Morishita, Kohei and Nakajima, Kazuo and Mitsuda, Kazuhisa},
 issue = {6S1},
 journal = {Japanese Journal of Applied Physics},
 month = {Jun},
 note = {著者人数: 13名, Accepted: 2017-02-07, 資料番号: SA1170004000},
 title = {X-ray evaluation of high-verticality sidewalls fabricated by deep reactive ion etching},
 volume = {56},
 year = {2017}
}