@article{oai:jaxa.repo.nii.ac.jp:00032780,
 author = {古浦, 勝久 and KOURA, Katsuhisa},
 journal = {宇宙科学研究所報告. 特集: 宇宙航行の力学シンポジウム報告},
 month = {Mar},
 note = {酸素分子への共鳴付着(e+O_2&xrarr;O_2^<-*>)による電子速度分布のHole Burningをモンテカルロシミュレーションにより調べた。Holeは常温では分子熱運動のため現れず, 分子熱運動が減少する低温(T&lsim;100°K)で出現する。従って, Shimamori and Hatanoによって常温で測定された付着速度定数は, Crompton等の指摘した付着冷却効果を受けていない。, The hole burning into the velocity distribution of thermal electrons due to the resonance attachment to O_2 (e+O_2&xrarr;O_2^<-*>) is studied using the Monte Carlo simulation. The thermal molecular motion is found to play an important role in the hole burning process : The attachment hole is not burned at room temperature and appears at the lower temperature T&lnsim;100°K owing to the decrease in the thermal molecular motion. Therefore, the attachment rate constant measured by Shimamori and Hatano at room temperature does not suffer the attachment cooling effect indicated by Crompton et al., 資料番号: SA0166536000},
 pages = {25--28},
 title = {酸素分子への共鳴付着による電子速度分布の Hole Burning},
 volume = {3},
 year = {1982}
}