{"created":"2023-06-20T15:12:12.886690+00:00","id":41998,"links":{},"metadata":{"_buckets":{"deposit":"633b7e1c-2217-46d8-9967-aa25f714c426"},"_deposit":{"created_by":1,"id":"41998","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"41998"},"status":"published"},"_oai":{"id":"oai:jaxa.repo.nii.ac.jp:00041998","sets":["1887:1893","1896:1898:1933:1934"]},"author_link":["502021","502019","502018","502012","502016","502013","502020","502017","502015","502014"],"item_3_alternative_title_1":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"レーザーフラッシュ法による溶融InGaAsの熱拡散率の測定"}]},"item_3_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2000-09-29","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"54","bibliographicPageStart":"51","bibliographic_titles":[{"bibliographic_title":"宇宙開発事業団技術報告"},{"bibliographic_title":"NASDA Technical Memorandum","bibliographic_titleLang":"en"}]}]},"item_3_description_16":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"溶融In(0.8)Ga(0.2)Asの熱拡散率をレーザ・フラッシュ法を使って測定した。In(0.8)Ga(0.2)As 試料は薄い黒鉛円盤に挟まれ、砒素の高蒸気圧に耐える充分な強度を有した平面窓を持つ水晶容器に封入した。結果として、3層のセルを形成した。溶融In(0.8)Ga(0.2)Asの熱拡散率は融点から1,150度Cまでで、10〜12mm(exp 2)/sであった。測定された熱拡散率のばらつきは5%以下であった。","subitem_description_type":"Abstract"}]},"item_3_description_17":{"attribute_name":"抄録（英）","attribute_value_mlt":[{"subitem_description":"Thermal diffusivity of molten In(0.8)Ga(0.2)As was measured using the laser-flash method. The sample In(0.8)Ga(0.2)As was sandwiched between thin graphite disks, and sealed in a transparent quartz container with a flat window of sufficient strength to withstand the high-vapor pressure of arsenic. As a result, a three-layered cell was formed. Thermal diffusivity of molten In(0.8)Ga(0.2)As was 10 - 12 mm(exp 2)/s from melting point to 1,150 C. Scattering of the measured thermal diffusivity was less than 5 percent.","subitem_description_type":"Other"}]},"item_3_description_32":{"attribute_name":"資料番号","attribute_value_mlt":[{"subitem_description":"資料番号: AA0029300005","subitem_description_type":"Other"}]},"item_3_description_33":{"attribute_name":"レポート番号","attribute_value_mlt":[{"subitem_description":"レポート番号: NASDA-TMR-000007E","subitem_description_type":"Other"}]},"item_3_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宇宙開発事業団"}]},"item_3_publisher_9":{"attribute_name":"出版者（英）","attribute_value_mlt":[{"subitem_publisher":"National Space Development Agency of Japan (NASDA)"}]},"item_3_source_id_21":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1345-7888","subitem_source_identifier_type":"ISSN"}]},"item_3_source_id_24":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00364784","subitem_source_identifier_type":"NCID"}]},"item_3_text_6":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"宇宙開発事業団 宇宙環境利用研究センター"},{"subitem_text_value":"宇宙開発事業団 宇宙環境利用研究センター"},{"subitem_text_value":"エイ・イー・エス 宇宙ステーショングループ"},{"subitem_text_value":"エイ・イー・エス 宇宙ステーショングループ"},{"subitem_text_value":"宇宙開発事業団 宇宙環境利用研究システム"}]},"item_3_text_7":{"attribute_name":"著者所属（英）","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"National Space Development Agency of Japan Space Utilization Research Center"},{"subitem_text_language":"en","subitem_text_value":"National Space Development Agency of Japan Space Utilization Research Center"},{"subitem_text_language":"en","subitem_text_value":"Advanced Engineering Services Co Ltd Space Station Group"},{"subitem_text_language":"en","subitem_text_value":"Advanced Engineering Services Co Ltd Space Station Group"},{"subitem_text_language":"en","subitem_text_value":"National Space Development Agency of Japan Space Utilization Research Program"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"長島, 敏夫"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"加藤, 浩和"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"林, 義雄"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"-"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"木下, 恭一"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Nagashima, Toshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kato, Hirokazu","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Hayashi, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Hayakawa, Harunobu","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kinoshita, Kyoichi","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-02-10"}],"displaytype":"detail","filename":"29300005.pdf","filesize":[{"value":"374.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"29300005.pdf","url":"https://jaxa.repo.nii.ac.jp/record/41998/files/29300005.pdf"},"version_id":"25a0fef9-104a-48ea-a2f7-8f8378f0fe8c"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"熱拡散率","subitem_subject_scheme":"Other"},{"subitem_subject":"レーザ・フラッシュ法","subitem_subject_scheme":"Other"},{"subitem_subject":"In(0.8)Ga(0.2)As","subitem_subject_scheme":"Other"},{"subitem_subject":"黒鉛円盤","subitem_subject_scheme":"Other"},{"subitem_subject":"砒素","subitem_subject_scheme":"Other"},{"subitem_subject":"高速IC","subitem_subject_scheme":"Other"},{"subitem_subject":"光電材料","subitem_subject_scheme":"Other"},{"subitem_subject":"レーザダイオード","subitem_subject_scheme":"Other"},{"subitem_subject":"単結晶","subitem_subject_scheme":"Other"},{"subitem_subject":"透明クオーツ容器","subitem_subject_scheme":"Other"},{"subitem_subject":"高蒸気圧","subitem_subject_scheme":"Other"},{"subitem_subject":"thermal diffusivity","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"laser flash method","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"In(0.8)Ga(0.2)As","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"graphite disk","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"arsenic","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"high speed IC","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"optoelectronic material","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"laser diode","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"monocrystal","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"transparent quartz container","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"high vapor pressure","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"technical report","resourceuri":"http://purl.org/coar/resource_type/c_18gh"}]},"item_title":"Measurements of thermal diffusivity of molten InGaAs by the laser flash method","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Measurements of thermal diffusivity of molten InGaAs by the laser flash method","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["1893","1934"],"pubdate":{"attribute_name":"公開日","attribute_value":"2015-03-26"},"publish_date":"2015-03-26","publish_status":"0","recid":"41998","relation_version_is_last":true,"title":["Measurements of thermal diffusivity of molten InGaAs by the laser flash method"],"weko_creator_id":"1","weko_shared_id":1},"updated":"2023-06-20T20:23:56.204954+00:00"}