@techreport{oai:jaxa.repo.nii.ac.jp:00042835,
 author = {寺嶋, 一高 and 西村, 鈴香 and 北村, 大剛 and Terashima, Kazutaka and Nishimura, Suzuka and Kitamura, Daigo},
 month = {Dec},
 note = {The oxygen diffusion has been studied by using the capillary technique. As the initial stage of quartz dissolution into silicon melts causes an experimental error, the holding time of more than 30 min was needed to analyze the diffusion constant. The analyzed diffusion constant of oxygen atoms in silicon melts is suggested to be 2 x 10(exp -4) cm(sup 2)/s., 資料番号: AA0045399015, レポート番号: NASDA-TMR-020025E},
 title = {Study of oxygen atom diffusion coefficient in silicon melts},
 year = {2002}
}