| Item type |
テクニカルレポート / Technical Report(1) |
| 公開日 |
2015-03-26 |
| タイトル |
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タイトル |
Lubrication Properties of Molybdenum Disulfide Films Deposited by RF Sputtering Method |
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言語 |
en |
| 言語 |
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言語 |
eng |
| 資源タイプ |
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資源タイプ識別子 |
http://purl.org/coar/resource_type/c_18gh |
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資源タイプ |
technical report |
| その他のタイトル |
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その他のタイトル |
高周波スパッタリング法による二硫化モリブデン膜の潤滑特性に関する研究 |
| 著者 |
西村, 允
野坂, 正隆
鈴木, 峰男
関, 勝美
宮川, 行雄
NISHIMURA, Makoto
NOSAKA, Masataka
SUZUKI, Mineo
SEKI, Katsumi
MIYAKAWA, Yukio
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| 著者所属 |
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航空宇宙技術研究所宇宙研究グループ |
| 著者所属 |
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航空宇宙技術研究所宇宙研究グループ |
| 著者所属 |
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航空宇宙技術研究所宇宙研究グループ |
| 著者所属 |
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航空宇宙技術研究所宇宙研究グループ |
| 著者所属 |
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航空宇宙技術研究所宇宙研究グループ |
| 著者所属（英） |
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en |
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Space Technology Research Group, National Aerospace Laboratory(NAL) |
| 著者所属（英） |
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en |
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Space Technology Research Group, National Aerospace Laboratory(NAL) |
| 著者所属（英） |
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en |
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Space Technology Research Group, National Aerospace Laboratory(NAL) |
| 著者所属（英） |
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en |
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Space Technology Research Group, National Aerospace Laboratory(NAL) |
| 著者所属（英） |
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en |
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Space Technology Research Group, National Aerospace Laboratory(NAL) |
| 出版者 |
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出版者 |
航空宇宙技術研究所 |
| 出版者（英） |
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出版者 |
National Aerospace Laboratory(NAL) |
| 書誌情報 |
航空宇宙技術研究所報告
en : Technical Report of National Aerospace Laboratory TR-903
巻 903,
p. 57,
発行日 1986-03
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| 抄録（英） |
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内容記述タイプ |
Other |
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内容記述 |
An RF sputtering apparatus with a pair of targets has been developed for depositing a film of uniform thickness onto a complex-geometric specimen such as the retainer of a ball bearing. The deposition characteristics of the apparatus were compared with those of the conventional sputtering apparatus. Lubrication properties of MoS2 films made by these devices were also compared under a variety of conditions. Finally, friction and wear of MoS2 films applied to angular-contact type ball bearings of 20 mm bore were studied in air, nitrogen and vacuo. The two-target sputtering has an advantage mentioned above, however, the films deposited by the method exhibited a rather short wear life because of the temperature rise of the substrate during ion bombardment and during the sputtering process. This temperature dependence was observed in films on those substrates that had been heated with a built-in heater during sputtering. The film thickness measurement and the observation by a SEM showed this was attributed to the porous growth of films. Thus substrates should be kept at low temperatrues when one wants to obtain an MoS2 film of high quality. As a whole, sputtered MoS2 films are an excellent lubricant under sliding contact as well as rolling contact conditions in regard to friction force and endurance life. |
| ISSN |
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収録物識別子タイプ |
ISSN |
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収録物識別子 |
0389-4010 |
| 資料番号 |
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内容記述タイプ |
Other |
|
内容記述 |
資料番号: NALTR0903000 |
| レポート番号 |
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内容記述タイプ |
Other |
|
内容記述 |
レポート番号: NAL TR-903 |
naltr00903.pdf (12.1 MB)
